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Registered Member #190
Joined: Fri Feb 17 2006, 12:00AM
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Posts: 1567
I use positive photoresist and use sodium metasilicate pentahydrate to remove the non-fixed material. Would plain store-bought sodium hydroxide work just as well? I believe I just need a basic solution to remove the unfixed photoresist, right?
Also, to remove the copper I am using ammonium persulfate. Can I use sodium bisulphate, which I can get much cheaper.
Registered Member #311
Joined: Sun Mar 12 2006, 08:28PM
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Posts: 253
Silicate based developers are much better then hydroxide - the margin between "develop" and "strip" is very high, If nothing else this means it isn't significantly temperature sensitive. And made-up solution has indefinite shelf-life.
Registered Member #190
Joined: Fri Feb 17 2006, 12:00AM
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Posts: 1567
mikeselectricstuff wrote ...
Silicate based developers are much better then hydroxide - the margin between "develop" and "strip" is very high, If nothing else this means it isn't significantly temperature sensitive. And made-up solution has indefinite shelf-life.
I tried 3% hydroxide and it was talking too long. Are there any other alternatives than sodium metasilicate that are just as good?
Registered Member #311
Joined: Sun Mar 12 2006, 08:28PM
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silicate/hydroxide is for developing, not etching! The nice thing about silicate is you can mix it strong enough to develop as fast as 10 seconds, but not strip after a minute. Different brands of photoresist can vary greatly in sensitivity & develop time so some experimentation is needed.
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Chemical for PCB fabrication
