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Registered Member #1667
Joined: Sat Aug 30 2008, 09:57PM
Location:
Posts: 373
I'm using CCl4 in the lab and, wondering what else this stuff might be good for (apart from depleting the ozone layer, contaminating soil and growing cancers), I did a bit of google-ing and ended up with this article:
248nm / 351nm excimer lasers are used to do some neat surface chemistry here. I wonder if it's just KrF / XeF that dictates the wavelengths. If so, wouldn't longitudinally excited N2 lasers also work?
The paper also mentions chlorine gas as a reagent. I can imagine a N2 laser based lithography system. Cl2 gas can be produced by chlorine alkaline electrolysis. The exhaust stream can be burnt in hydrogen and after washing in the NaOH solution (byproduct), we're back where we started. Sounds too good to be true, doesn't it?
Why go through all the trouble? (*) It's called anisotropic etching, an enabling technology for micron-scale 3D objects fabrication ...
________________ (*) unrelated picture ripped from
Registered Member #96
Joined: Thu Feb 09 2006, 05:37PM
Location: CI, Earth
Posts: 4059
Interesting. I expect that using regular ampersulf with a focussed UV laser and precise timing would also work, as it seems that adding oxygen increases the etch speed. So using some chemical that evolves oxygen when hit with blue or UV light would probably work. -A
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laser-assisted etching of copper
(*)